Hydrogen plasma passivation of GaAs

Fishing – trapping – and vermin destroying

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437937, 427569, 156643, H01L 2100, H01L 2102, H01L 21265, H01L 21329

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active

051790297

ABSTRACT:
Hydrogen Plasma surface passivation of III-V Semiconductors is critically dependent on exposure time and pressure because of competition between plasma passivation and damage. Proper control of pressure according to the invention yields reproducible and stable passivation. Improved passivation is obtained using high pressure hydrogen plasmas, i.e. above 1 Torr.

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