Photoimageable compositions comprising polyquinoline polymer and

Details Photoimageable compositions comprising polyquinoline polymer and Photoimageable compositions comprising polyquinoline polymer and

1997-04-28

1999-03-30

Truong, Duc

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Nitrogen-containing reactant

528125, 528491, 528492, 528493, 528495, 528502D, 427457, 4273722, 4274071, 430141, 430149, C08G 7306

Patent

active

058891412

ABSTRACT:
Photoimageable polyquinoline compositions comprise a polyquinoline polymer, a diazonaphthoquinone and optionally a photosensitizer. The composition is prepared by dissolving the polyquinoline polymer, diazonaphthoquinone and photosensitizer in a solvent to form a solution, coating the solution onto a substrate and thereafter removing the solvent to form a film. The film is exposed to light through a photomask and developed by immersion in a selective solvent to yield a photopatterned dielectric film.

REFERENCES:
patent: 3756982 (1973-09-01), Vorshak
patent: 4000187 (1976-12-01), Stille
patent: 4507462 (1985-03-01), Stille
patent: 5017677 (1991-05-01), Stille
patent: 5247050 (1993-09-01), Hendricks
patent: 5723573 (1998-03-01), Morrocco, III et al.
Chem Abstract 126: 310,450 Photosensitive resin composition and heat resistant relief polymer pattern formation (Keji et al.).

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