Method of treating semiconductor device to improve its electrica

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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427255, 427344, H01L 2138

Patent

active

040072975

ABSTRACT:
Certain electrical characteristics of a semiconductor device which includes a body of semiconductor material are improved by exposing the semiconductor device to a substantially water vapor free atmosphere of chlorine and heating the device in this atmosphere.

REFERENCES:
patent: 2744000 (1956-05-01), Seiler
patent: 3556879 (1971-01-01), Mayer
patent: 3556880 (1971-01-01), Heiman et al.
patent: 3692571 (1972-09-01), Colton et al.
patent: R28385 (1975-04-01), Mayer
patent: R28386 (1975-04-01), Heiman et al.
E. Kool, "The Surface Properties of Oxidized Silicon" 1967, pp. 34-35.

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