Method of forming a nitride layer

Details Method of forming a nitride layer Method of forming a nitride layer

1985-05-14

1986-02-11

Beck, Shrive P.

Coating processes

Coating by vapor, gas, or smoke

Base includes an inorganic compound containing silicon or...

118717, 4272552, 427249, C23C 1600

Patent

active

045698627

ABSTRACT:
A method of forming a layer of a nitride or carbonitride of titanium, vanadium or the like on the surface of an article to be treated includes: disposing a treating material composed of refractory powder, powder of a metal or alloy of a nitride forming element and a halide power, and the article to be treated in a fluidized bed furnace; and introducing a nitrogen-containing gas into the furnace under a heated condition to fluidize the treating material, thereby effecting the surface treatment. This method provides a nitride or carbonitride layer having a smooth surface and a uniform thickness rapidly and safely without using hydrogen and a halogen vapor.

REFERENCES:
patent: 3197328 (1965-07-01), Jung et al.
patent: 4461656 (1984-07-01), Ross
patent: 4535000 (1985-08-01), Gordon

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