Position detection technique applied to proximity exposure

Details Position detection technique applied to proximity exposure Position detection technique applied to proximity exposure

1998-02-26

2000-04-11

Gray, David M.

Photocopying

Projection printing and copying cameras

Step and repeat

430 22, 356400, G03B 2742, G03F 900, G01B 1100

Patent

active

060493739

ABSTRACT:
The exposure surface of a wafer to be exposed is formed with a wafer mark having edges for scattering incident light. The edge of the wafer mark has a curved portion whose image vertically projected upon a plane in parallel to the exposure surface has a curved shape. The surface of an exposure mask is formed with a mask mark having edges for scattering incident light. The edge of the exposure mask has a curved portion whose image vertically projected upon a plane in parallel to the surface of the exposure mask has a curved shape. The wafer and exposure mask are juxtaposed with and spaced apart by a gap from the exposure surface of the wafer. Illumination light is applied to the curved portions of the edges of the wafer and mask marks. Light scattered from the wafer and mask marks is observed along a direction oblique to the exposure surface to thereby detect a relative position of the wafer and exposure mask.

REFERENCES:
patent: 4390279 (1983-06-01), Suwa
patent: 5151750 (1992-09-01), Magome et al.
patent: 5689339 (1997-11-01), Ota et al.

Affiliated with

Also associated with

Rating

Position detection technique applied to proximity exposure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Position detection technique applied to proximity exposure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Position detection technique applied to proximity exposure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1180770