Embossed substrate and photoreceptor device incorporating the sa

Details Embossed substrate and photoreceptor device incorporating the sa Embossed substrate and photoreceptor device incorporating the sa

1997-06-04

1998-08-04

Goodrow, John

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 69, G03G 510

Patent

active

057891257

ABSTRACT:
An embossed substrate comprising a substrate of a plastic material and having a surface and an embossed surface carried by the surface of the substrate. The embossed surface is characterized by having a pattern with an average roughness of between 100 nanometers and 300 nanometers with the roughness being distributed substantially uniformly over the surface, the pattern has ridges and valleys with the horizontal distance between adjacent ridges and/or valleys being greater than the depth between the ridges and the valleys. The peaks and the valleys are randomly disposed without periodicity to cause diffusion of light impinging thereon to minimize or eliminate interference effects when the embossed surface overcoated with thin planar organic layers is exposed to light.

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patent: 5635324 (1997-06-01), Rasmussen et al.

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