Stock material or miscellaneous articles – Structurally defined web or sheet – Including components having same physical characteristic in...
Patent
1996-12-12
1998-08-04
Turner, Archene
Stock material or miscellaneous articles
Structurally defined web or sheet
Including components having same physical characteristic in...
428217, 428336, 428701, 428702, B32B 702
Patent
active
057890714
ABSTRACT:
A method and apparatus for monitoring and controlling deposition of metal, insulating compounds or other compounds on a substrate by sputtering techniques includes maintaining pulsed, constant, direct current power to the target, sensing the voltage of the target material used in the process, simultaneously rapidly sensing the partial pressure of the reactive gas, and simultaneously biasing the substrate to activate the reactive gas or otherwise energizing the reactive gas in the vicinity of the substrate. Low temperature coating (eg., below 550.degree. C.) of compounds such as alumina is effected by introduction of an extra energy source such as a radio frequency coil to the sputtering system to enhance the ionization potential of the positive ions. The asymmetric direct current pulsed magnetron power source is coupled to the cathode, as well as the substrate to be coated. An apparatus for practicing the invention is also disclosed and examples of various oxide coatings using the method of the invention are disclosed. A multilayer coating of nanometer scale layers of yttrium oxide and zirconium oxide having increased hardness is disclosed.
REFERENCES:
patent: 4428811 (1984-01-01), Sproul et al.
patent: 4749629 (1988-06-01), Sarin et al.
patent: 4835062 (1989-05-01), Holleck
patent: 5310603 (1994-05-01), Fukuda et al.
Prediction of New Low Compressibility Solids; Science, vol. 245, Aug. 25, 1989, Liu and Cohen.
Structural Properties and Electronic Structure of Low-Compressibility Materials: . . . ; Physical Review B, vol. 41, No. 15, May 15, 1990-II, pp. 727-734, Liu and Cohen.
Reactive Sputtering of Carbon and Carbide Targets in Nitrogen; J. Vac. Sci. Technol. 16(2) , Mar./Apr. 1979, pp. 299-302, Cuomo, Leary, Yu, Reuter and Frisch.
Structural and Optical Properties of Amorphous Carbon Nitride; Solid State Communications, vol. 65, No. 9, pp. 921-923, Man and Feldman.
Structure and Bonding Studies of the C:N Thin Films Produced by rf Sputtering Method; J. Mater. Res., vol. 5, No. 11, Nov., 1990, pp. 2490-2496, Torng, Sivertsen, Judy, Chang.
Carbon-Nitrogen Pyrolyzates: Attempted Preparation of Carbon Nitride; Communications of the American Ceramic Society, vol. 74, No. 7, pp. 1686-1688, Maya, Cole and Hagaman.
Chemical Preparation and Shock Wave Compression of Carbon Nitride Precursors; J. Am. Ceram. Soc. 73(7) vol. 23 No. 7 1990 pp. 1973-1978, Wixom.
A Graphitic Carbon Nitride, J. Mat. Sci. Letters, 9(1990), pp. 1376-1378, Sekine, Kanda, Bando, Yokoyama, Hojou.
Structure and Properties of a-C:N Films Prepared by Pulsed Excimer Laser Deposition; MRS Sym. Proc. vol. 28 (1993), pp. 1-6, Xiong, Chang and White.
Properties of Carbon Nitride Thin Films Prepared by Ion and Vapor Deposition; Nuclear Instruments and Methods in Physics Research B80/81 (1993) pp. 463-466, Chubachi, et al.
Properties of Carbon Nitride Films with Composition Ratio C/N=0. 5.about.3.0 Prepared by Ion and Vapor Deposition (IVD) Method; Appl. Phys. 76 (1994) , pp. 1-26, Ogata, et al.
Experimental Realization of the Covalent Solid Carbon Nitride; Science, vol. 261, Jul. 16, 1993, pp. 334-337, Niu, Lu and Lieber.
Observation of Crystalline C.sub.3 N.sub.4 ; Physical Review B, vol. 49, No. 7, Feb. 15, 1994, pp. 5034-5037, Yu, Cohen, Haller, Hansen, Liu and Wu.
Physical Properties of a-C:N Films Produced by Ion Beam Assisted Deposition; J. Mater. Res., vol. 9, No. 9, Sep. 1994, pp. 2440-2449, Rossi, et al.
Carbon Nitride Deposited Using Energetic Species: A Two Phase System; Physical Review Letters, vol. 73, No. 1, Jul. 4, 1994, pp. 118-121, Marton, et al.
Ion-Assisted Laser Processing of CN.sub.x Films; Mat. Sci. and Eng. B26 (1994), pp. 49-53, Narayan, et al.
Nano-Indentation Studies of Ultrahigh Strength Carbon Nitride Thin Films; J. Appl. Phys. 74(1), Jul. 1, 1993, pp. 219-223, Li, Chung, Wong and Sproul.
Infrared Absorption and Nuclear Magnetic Resonance Studies of Carbon Nitride Thin Films Prepared by Reactive Magnetron Sputtering; J. Vac. Sci. Technol. A 12(4), Jul./Aug. 1994.
Symmetry Breaking in Nitrogen-Doped Amorphous Carbon: Infrared Observation of the Raman-Active G And D Bands; Physical Review B, vol. 39, No. 18, Jun. 15, 1989, pp. 53-60, Kaufman.
Synthesis and Characterization of Super-Wear-Resistant Carbon Nitride Coatings; Diamond Films and Technology, vol. 4, No. 2, 1994, pp. 99-111, Lin, Dravid, Chung, et al.
Composition, Structure and Tribological Properties of Amorphous Carbon Nitride Coatings, Surface Coatings Technology, 68/69 (1994) pp. 611-615, Li, Cutiongo, et al.
Nano-Indentation and Tribological Studies of Ultrahigh Strength Carbon Nitride Thin Films; Tribology Transactions, vol. 37(1994) 3, pp. 479-482, Li, Chung, et al.
Reactive Unbalanced Magnetron Sputter Deposition of Polycrystalline TiN/NbN Superlattice Coatings; Surface and Coatings Technology, 37 (1993) pp. 13-18, Chu, Barnett, et al.
Deposition and Properties of Polycrystalline TiN/NbN Superlattice Coatings; J. Vac. Sci. Technol. A 10(4), Jul./Aug. 1992, pp. 1604-1609, Chu, Wong, et al.
Characterization of the .alpha.-SN/CDTE (110) Interface by Angle-Resolved X-Ray Photoemission, Mat. Res. Soc. Symp. Proc. vol. 77 1987, pp. 247-252, Lin, Partin and Chung.
High Rate Reactive Sputtering in an Opposed Cathode Closed-Field Unbalanced Magnetron Sputtering System; Surface and Coatings Technology, 43/44 (1990) pp. 270-278, Sproul, et al.
The Effect of Target Power on the Nitrogen Partial Pressure Level and Hardness of Reactively Sputtered Titanium Nitride Coatings; Thin Solid Films 171 (1989) pp. 171-181, Sproul, et.
Mechanical Properties of Amorphous Carbon Nitride Thin Films Prepared by Reactive Magnetron Sputter-Deposition; Tribology Letters 1 (1995) pp. 87-93, Li, Chung, Wong and Sproul.
Deposition and Mechanical Properties of Superlattice Thin Films; 1993, Barnett, pp. 1-76.
Model Of Superlattice Yield Stress and Hardness Enhancements; J. Appl. Phys. 77(9), May 1, 1995, pp. 4403-4411, Chu and Barnett.
Ming Yung Chen, Growth and Characterization of CN.sub.x Thin Films, Dec., 1994, Northwestern Univ. Library.
"Ion Irradiation Effects During Growth of Mo/V(001) Superlattices by Dual-Target Magnetron Sputtering"; J. of Crystal Growth 121 (1992) pp. 399-412; Hakansson et al.
Ti/Ti-N Hf/Hf-N and W/W-N Multilayer Films with High Mechanical Hardness; Appl. Phys. Lett 61(6); Aug. 10, 1992, pp. 654-656; Shih and Dove.
Growth of Single-Crystal TiN/VN Strained-Layer Superlattices with Extremely High Mechanical Hardness; J. Appl. Phys. 62(2); Jul. 15, 1987, pp. 481-484; Helmersson, Todorova, Barnett, Sundgren, Markert and Greene.
Wavelength-Property Correlation in Electrodeposited Ultra-structured Cu-Ni Multilayers; J. Electrochem. Soc., vol. 137, No. 2, Feb. 1990, pp. 440-444; Menezes and Anderson.
Contemporary Preparative Techniques; Physics of Thin Films; vol. 14, title page and index; Francombe and Vossen.
The Elastic and Structural Properties of Cu-Pd Superlattices; Northwestern University, Dissertation by Bradley Marc Davis.
Elastic and Nanostructural Properties of Cu/Pd Superlattices; J. Mater. Res., vol. 7, No. 7, Jun. 1992; pp. 1356-1369; Davis, Li, Seidman, Ketterson, Bhadra and Grimsditch.
An Ultrahigh Vacuum, Magnetron Sputtering System for the Growth and Analysis of Nitride Superlattices; J. Vac. Sci. Technol.A 10(1), Jan./Feb. 1992; pp. 75-81; Mirkarimi, Shinn and Barnett.
Growth, Structure, and Microhardness of Epitaxial TiN/NbN Superlattices; J. Mater. Res., vol. 7, No. 4, Apr. 1992; pp. 901-911; Shinn, Hultman and Barnett.
Deposition and Properties of Polycrystalline TiN/NbN Superlattice Coatings; J. Vac. Sci. Technol. A 10(4), Jul./Aug. 1992; pp. 1604-1609; Chu, Wong, Sproul, Rhode and Barnett.
Cross-section Preparation for TEM of Film-Substrate Combinations with a Large Difference in Sputtering Yields; J. Elec. Micro. Techn., 1986, pp. 361-369; Helmersson and Sundgren.
The Effect of Target Power on the Nitrogen Partial Pressure Level and Hardness of Reactively Sputtered Titanium Nitride Coatings; Thin Solid Films, 171 (1989) pp. 171-181; Sproul, Rudnik and Gogol.
High Rate Reactive Sputtering Process Control; Surface and
Barnett Scott A.
Lefkow Anthony
Sproul William D.
Wong Ming-Show
Yashar Phillip
Northwestern University
Turner Archene
LandOfFree
Multilayer oxide coatings does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Multilayer oxide coatings, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Multilayer oxide coatings will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1175032