Deposition of insulating thin film by a plurality of ion beams

Details Deposition of insulating thin film by a plurality of ion beams Deposition of insulating thin film by a plurality of ion beams

1997-02-10

1999-10-05

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Ion plating or implantation

427528, 427595, 20419211, C23C 1408, C23C 1400

Patent

active

059620803

ABSTRACT:
A method of depositing insulating thin films on a substrate employs a target that is formed of material which includes a constituent element of the insulating thin film. An ion beam preferably of inert gas is then directed toward the target to disperse the target material. Simultaneously, a second ion beam which includes another constituent element of the insulating thin film is also directed toward the substrate. The material from the target and the element of the second ion beam react in proper stoichiometry and is deposited onto the substrate as the insulating thin film.

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