Method for patterning photo resist film

Details Method for patterning photo resist film Method for patterning photo resist film

1988-12-14

1990-02-13

Chaudhuri, Olik

Fishing, trapping, and vermin destroying

148DIG137, 1566591, 430325, 437949, H01L 2147, H01L 21312

Patent

active

049006967

ABSTRACT:
A method for patterning a photo resist film including the steps of coating a photo resist onto a semiconductor substrate exposing the photo resist coated and thereafter developing it, to thereby form a pattern on the photo resist film, wherein after exposure the semiconductor substrate on which the photo resist is coated is left in an atmosphere of a higher relative humidity than that at which the patterning exposure has been conducted for a time period until development.

REFERENCES:
patent: Re29015 (1976-10-01), De Angelo et al.
patent: 4072529 (1978-02-01), Hoornstra et al.
patent: 4375390 (1983-03-01), Anderson et al.
patent: 4704348 (1987-11-01), Koizumi et al.

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