Method for removing contaminants by maintaining the plasma in ab

Details Method for removing contaminants by maintaining the plasma in ab Method for removing contaminants by maintaining the plasma in ab

1991-05-22

1992-11-17

Morris, Theodore

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

134 21, 156643, B08B 312

Patent

active

051634589

ABSTRACT:
An apparatus is disclosed for abrading contaminants from the surface of a workpiece using plasma glow discharge. The workpieces are positioned in a low pressure chamber with an ionizable gas. A pair of spaced, conductive, interfacing panels form electrodes mounted within the chamber and defining a three-dimensional cleaning space between the electrodes. The electrodes are energized by a power supply, providing an alternating voltage at an ultrasonic frequency and the pressure is maintained to allow only abnormal glow discharge. After initiation of the abnormal glow discharge the electrode current is sensed to detect when to inject additional ionizable gas into the low pressure chamber.

REFERENCES:
patent: 4522681 (1985-06-01), Gorowitz et al.
patent: 4622094 (1986-11-01), Otsubo
patent: 4797178 (1989-01-01), Bui et al.
patent: 4935115 (1990-06-01), Chambaere et al.
patent: 4971667 (1990-11-01), Yamazaki et al.

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