Shimming substrate holder assemblies to produce more uniformly p

Abrading – Abrading process – Glass or stone abrading

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Details

451285, 451287, 451289, 451388, B24B 700

Patent

active

059613750

ABSTRACT:
A substrate holder assembly for retaining a substrate during chemical mechanical polishing is described. The substrate holder assembly includes: (i) a backing plate including a contact surface adapted for supporting components of the substrate holder assembly and the substrate; (ii) a shim positioned adjacent the contact surface of the backing plate for applying pressure on the substrate during chemical-mechanical polishing; and (iii) a carrier film disposed adjacent the shim such that at least a portion of the carrier film adjacent the shim protrudes outwardly.

REFERENCES:
patent: 3977130 (1976-08-01), Degner
patent: 4530139 (1985-07-01), Miller
patent: 5533924 (1996-07-01), Stroupe et al.
patent: 5573448 (1996-11-01), Nakazima et al.
patent: 5643053 (1997-07-01), Shendon et al.
patent: 5766058 (1998-06-01), Lee et al.

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