Photolabile blocked surfactants

Details Photolabile blocked surfactants Photolabile blocked surfactants

1988-01-15

1990-12-25

Springer, David B.

Chemistry of carbon compounds

Miscellaneous organic carbon compounds

C-metal

548494, 546168, 2604055, 260408, 260399, C07C 7922

Patent

active

049800965

ABSTRACT:
Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials.
Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.

REFERENCES:
patent: 3745188 (1973-07-01), Bottorff
patent: 4369244 (1983-01-01), Eian et al.
patent: 4467022 (1984-08-01), Eian et al.

Affiliated with

Also associated with

Rating

Photolabile blocked surfactants does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolabile blocked surfactants, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolabile blocked surfactants will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1161195