Process for forming silica film

Details Process for forming silica film Process for forming silica film

1997-10-03

2000-08-08

Pianalto, Bernard

Coating processes

With post-treatment of coating or coating material

Heating or drying

427435, 4274432, B05D 302

Patent

active

06099911&

ABSTRACT:
A process for forming a silica film on a substrate, comprising the steps of preparing a liquid composition comprising silicic acid, water, an alkali and an organic solvent, said liquid composition having a volume ratio of water to the organic solvent in a range of 0.2 to 10.0 and a concentration of silicon element in a range of 0.0001 to 5.0 mol/l; contacting a surface of a substrate with the liquid composition; and maintaining the contact between the surface of the substrate with the liquid composition to selectively deposit silica on the surface of the substrate until a silica film is formed on the surface of the substrate.

REFERENCES:
patent: 4375373 (1983-03-01), Abe et al.
Ohsaki et al., "Structural Analysis of SiO.sub.2 Gel Films by High Energy Electron Diffraction", J. of Sol-Gel Science and Technology, 2, 245-249, (1994) (No month available.).
Kagaku Kogaku Ronbunshu (Reports on Chemical Engineering), vol. 21, No. 5, pp. 879-885, 1995.
Effects of H.sub.2 O on structure of acid-catalysed SiO.sub.2 sol-gel films, Journal of Non-Crystalline Solids 183 (1995) Apr. 11, No. 3, pp 260-267.

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