Spin drier for silicon wafers and the like

Details Spin drier for silicon wafers and the like Spin drier for silicon wafers and the like

1982-11-03

1984-12-25

Schwartz, Larry I.

Drying and gas or vapor contact with solids

Apparatus

With means to treat gas or vapor

34 58, 34 69, 34187, F26B 1118

Patent

active

044895020

ABSTRACT:
Disclosed herein is a spin drier for silicon wafers and the like including a rotor equipped with at least one holder for a carrier, which is adapted to enclose a silicon wafer or the like therein, and a casing embracing the rotor. The spin drier is further provided with a guide member, which is disposed between the lower face of the rotor and the bottom wall of the casing and formed of a plurality of guide blades extending downwardly aslant in the rotating direction of the rotor. Owing to the provision of the guide member, water and dusts are prevented from splashing back onto the wafers or the like from the bottom wall of the casing. Thus, the wafers or the like can be dried faster without deleteriously affecting the washing effect.

REFERENCES:
patent: 3152875 (1964-10-01), Davis et al.
patent: 3246404 (1966-04-01), O'Connor
patent: 3566582 (1971-03-01), Yankura
patent: 4087924 (1978-05-01), Fujimoro et al.

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