Drying and gas or vapor contact with solids – Apparatus – With means to treat gas or vapor
Patent
1982-09-24
1984-12-25
Schwartz, Larry I.
Drying and gas or vapor contact with solids
Apparatus
With means to treat gas or vapor
34 58, 34 69, 34187, F26B 1118
Patent
active
044895011
ABSTRACT:
Disclosed herein is a spin drier for silicon wafers and the like including a rotor equipped with at least one holder for a carrier, which is adapted to enclose a silicon wafer or the like therein, and a casing embracing the rotor. The radial distance between the circumferential wall of the casing and the central axis of the rotor gradually increases as the circumferential wall extends all around the rotor in its circumferential direction from a position adjacent to an air exhaust port to the air exhaust port, thereby making an air conduit formed around the rotor gradually wider. The bottom wall of the casing gradually slopes down towards the air exhaust port. Owing to the above construction, the resistance to an air stream through the casing has been reduced, thereby preventing air from flowing back into the rotor after striking the circumferential wall of the casing and thus preventing stains and water on the circumferential wall of the casing from flowing back and sticking on wafers or the like.
REFERENCES:
patent: 2591669 (1952-04-01), Bucknell et al.
patent: 3152875 (1964-10-01), Davis et al.
patent: 3246404 (1966-04-01), O'Conor
patent: 3566582 (1971-03-01), Yankura
patent: 4087924 (1978-05-01), Fujimoro et al.
Schwartz Larry I.
Westphal David W.
LandOfFree
Spin drier for silicon wafers and the like does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Spin drier for silicon wafers and the like, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Spin drier for silicon wafers and the like will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1146401