Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-08-08
1995-05-02
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430191, 430192, 430193, 525285, G03F 7021, G03F 730
Patent
active
054118360
ABSTRACT:
A positive type photoresist composition contains (a) 100 parts by weight of a resin which is a polymer compound (A) including carbon-carbon double bonds and having a molecular weight of 300 to 30,000 and an iodine value of to 500. To at least a part of the double bonds of the polymer compound (A), a group represented by the formula (I) is introduced ##STR1## wherein R.sup.1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and R.sup.2 denotes an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group or an aryl group, The composition further contains (b) 25 to 100 parts by weight of a compound containing a quinone diazide unit.
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Otsuki Yutaka
Sato Haruyoshi
Yamasita Yukio
Yoda Eiji
Yuasa Hitoshi
Bowers Jr. Charles L.
Chu John S.
Nippon Oil Co. Ltd.
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