Photomask having patterns to reduce power of a stepper

Details Photomask having patterns to reduce power of a stepper Photomask having patterns to reduce power of a stepper

1994-06-10

1995-11-21

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430322, 430324, 430329, G03F 900

Patent

active

054685770

ABSTRACT:
An energy-saving photomask comprises: at least one first pattern region in which a light can penetrate through the photomask without diffraction; and a second pattern region in which a plurality of fine patterns are formed in such a way to serve as slits through which the light is diffracted to increase the energy of the light irradiated relative to the first pattern region and diffracted to an extent that it comes to have an insufficient energy for the development of all photosensitive film except below the first pattern region. By virtue of the auxiliary patterns, the energy of the light incident on the photosensitive film can be rich at the auxiliary patterns contributes intensity of light to the desired portions without seriously affecting other portions. Because of a reduction of processing time, the photomask prolongs the lifetime of a light lamp in the stepper, as well as allows usage of a stepper with low power.

REFERENCES:
patent: 5229230 (1993-07-01), Kamon

Affiliated with

Also associated with

Rating

Photomask having patterns to reduce power of a stepper does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask having patterns to reduce power of a stepper, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask having patterns to reduce power of a stepper will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1135852