Photomask

Details Photomask Photomask

1991-11-15

1994-01-18

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 22, 430311, 430396, G03F 100

Patent

active

052799115

ABSTRACT:
According to the inventive photomask, a light shielding pattern as well as a high reflection film are formed at one major surface side of a transparent substrate. Thus, a focal position in a resist film with respect to light directly passing through the high reflection film is separated from a focal position in the resist film with respect to light multiple-reflected by the high reflection film along the thickness direction of the resist film, whereby the depth of focus is enlarged as the result.

REFERENCES:
patent: 4764441 (1988-08-01), Ohta et al.
patent: 4873163 (1989-10-01), Watakabe et al.
patent: 4923772 (1990-05-01), Kirch et al.
patent: 5045417 (1991-09-01), Okamoto

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