Chemical vapor deposition

Details Chemical vapor deposition Chemical vapor deposition

1989-09-22

1991-02-19

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 118722, C23C 1600

Patent

active

049933612

ABSTRACT:
Precursor (9) is atomized by being ionized (11,12) and is then vaporized (14) prior to deposition. The ionized vapor is controlled by electrodes (2,15) to control its flow and/or its deposition on a substrate.

REFERENCES:
patent: 3436257 (1969-04-01), Myers
patent: 3970037 (1976-07-01), Sopko
patent: 4571350 (1986-02-01), Parker et al.

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