Method of mending a defect in a phase shift pattern

Details Method of mending a defect in a phase shift pattern Method of mending a defect in a phase shift pattern

1993-04-06

1995-11-21

Breneman, R. Bruce

Etching a substrate: processes

Forming or treating optical article

430 5, 378 35, B44C 122

Patent

active

054683378

ABSTRACT:
A method to mend a black defect and a white defect of a phase shift mask pattern so that the mended phase shift mask pattern has an accurately defined pattern. In the vicinity of a black defect and the area around the same, a mending phase shifter is formed into a thickness twice as large as the thickness d of a phase shifter. All light beams through a black defect area are nearly 0 degree out of phase with a non-phase-shifted light beam, thereby the phase shift mask pattern having the black defect becoming a phase shift mask pattern with an accurately defined pattern. In a similar manner, every light beam through a white defect area is nearly 180 degree out of phase with a non-phase-shifted light beam. As a result, a mended phase shift mask pattern has an accurately defined pattern.

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