Modified block copolymers functionalized in the monoalkenyl arom

Details Modified block copolymers functionalized in the monoalkenyl arom Modified block copolymers functionalized in the monoalkenyl arom

1992-12-18

1995-05-02

Wu, Shean

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525366, 525383, 525386, C08F29704, C08C 1900

Patent

active

H00014389

ABSTRACT:
The present invention relates to a thermally stable modified selectively hydrogenated high 1,2 content block copolymer wherein a functional group is grafted to the block copolymer in the vinylarene block.

REFERENCES:
patent: Re27145 (1971-06-01), Jones
patent: 3251905 (1966-05-01), Zelinski
patent: 3265765 (1966-08-01), Holden et al.
patent: 3390207 (1968-06-01), Moss et al.
patent: 3598887 (1971-08-01), Darcy et al.
patent: 3639517 (1972-02-01), Kitchen
patent: 3639521 (1972-02-01), Hsieh
patent: 3976628 (1976-08-01), Halasa et al.
patent: 4010226 (1977-03-01), Crossland et al.
patent: 4086171 (1978-04-01), Wood et al.
patent: 4145298 (1979-03-01), Trepka
patent: 4208356 (1980-06-01), Fukawa et al.
patent: 4219627 (1980-08-01), Halesa et al.
patent: 4292414 (1981-09-01), Saito et al.
patent: 4308353 (1981-12-01), Saito et al.
patent: 4409357 (1983-10-01), Milkovich
patent: 4427828 (1984-01-01), Hergenrother et al.
patent: 4471099 (1984-09-01), Trepka
patent: 4588765 (1986-05-01), Beever
B. C. Trivedi, B. M. Culbertson, Maleic Anhydride (Plenum Press, New York, 1982) pp. 172-173.

Affiliated with

Also associated with

Rating

Modified block copolymers functionalized in the monoalkenyl arom does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Modified block copolymers functionalized in the monoalkenyl arom, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Modified block copolymers functionalized in the monoalkenyl arom will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1128905