Positive resist composition and photosensitizers

Details Positive resist composition and photosensitizers Positive resist composition and photosensitizers

1996-10-17

1999-02-02

Powers, Fiona T.

Organic compounds -- part of the class 532-570 series

Organic compounds

Oxygen containing

534557, 568718, C07C 3915, C07C30971, C07C30976

Patent

active

058667245

ABSTRACT:
A positive photoresist compositions comprising, as a photosensitizer, a quinonediazide sulfonic acid ester of a phenol compound represented by the following formula (I): ##STR1## wherein Q.sup.1, Q.sup.2, Q.sup.3, Q.sup.4, Q.sup.5, Q.sup.6, Q.sup.7, Q.sup.8, Q.sup.9 and Q.sup.10 independently represent hydrogen, alkyl having 1-6 carbon atoms or phenyl, or Q.sup.1 and Q.sup.2, Q.sup.3 and Q.sup.4, Q.sup.5 and Q.sup.6, Q.sup.7 and Q.sup.8, or Q.sup.9 and Q.sup.10 may form a cycloalkane ring having 6 or less carbon atoms together with a carbon atoms to which they are connected, R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5, R.sup.6, R.sup.7, R.sup.8, R.sup.9, R.sup.10, R.sup.11, R.sup.12, R.sup.13, R.sup.14, R.sup.15 and R.sup.16 independently represent hydrogen, hydroxyl, alkyl having 1-6 carbon atoms or phenyl; and

REFERENCES:
patent: 5153096 (1992-10-01), Uenishi et al.
patent: 5407778 (1995-04-01), Uetani et al.
patent: 5407779 (1995-04-01), Uetani et al.
Database WPI, Patent Abstract AN 95-257302/JP-A-07 159 990 (1995) (Abstract).
Database WPI, Chemical Abstracts 123:213221 (1995) (Abstract).
Database WPI, Chemical Abstracts 125:181328/WO 96-20430 A1 (Abstract).

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