Method for fabrication of and apparatus for use as a semiconduct

Details Method for fabrication of and apparatus for use as a semiconduct Method for fabrication of and apparatus for use as a semiconduct

1997-03-03

1999-08-10

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430323, 430330, 430394, 216 12, G03F 108

Patent

active

059357347

ABSTRACT:
A method for fabricating photomasks including forming a resist layer located over a substrate, and heating the substrate at a temperature greater than the glass transition temperature of the resist, such that the resist layer flows. In this manner, defects such as pinholes within the resist layer are reduced.

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