Method of forming a piezoelectric layer with improved texture

Details Method of forming a piezoelectric layer with improved texture Method of forming a piezoelectric layer with improved texture

1997-10-07

1999-08-10

Beck, Shrive

Coating processes

Electrical product produced

Piezoelectric properties

42725519, 42725531, 42725534, 427255394, 4272557, 427576, 20419218, 20419222, C23C 1634, C23C 1408

Patent

active

059356413

ABSTRACT:
A method is provided for forming a piezoelectric layer with improved texture. In the method, a seed material is deposited on a substrate (12) at a low deposition rate to form a seed layer (16). The low deposition rate may be a rate in the range of 10.0-150 nanometers per hour. A piezoelectric material is deposited on the seed layer at a high deposition rate to form a bulk piezoelectric layer (20) having improved texture. The high deposition rate can be a rate in the range of 500-5000 nanometers per hour.

REFERENCES:
patent: 3615264 (1971-10-01), Berry et al.
patent: 4428808 (1984-01-01), Weinert et al.
patent: 5146299 (1992-09-01), Lampe et al.
patent: 5340799 (1994-08-01), Tauber et al.
patent: 5479875 (1996-01-01), Tachibana et al.
patent: 5567979 (1996-10-01), Nashimoto et al.
patent: 5698928 (1997-12-01), Mang et al.
patent: 5712001 (1998-01-01), Fujii et al.
Buchanon, Relva C., "Ceramic Materials for Electronics"; Marcel Dekker, Inc, New York, 1986, p. 141.

Affiliated with

Also associated with

Rating

Method of forming a piezoelectric layer with improved texture does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of forming a piezoelectric layer with improved texture, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of forming a piezoelectric layer with improved texture will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1117951