Gas separation – With nonliquid cleaning means for separating media – Solid agent cleaning member movingly contacts apparatus
Patent
1993-03-23
1994-09-13
Warden, Robert J.
Gas separation
With nonliquid cleaning means for separating media
Solid agent cleaning member movingly contacts apparatus
553851, 553856, 55485, 206204, 206334, 360 9702, B65B 500, B65D 8126, B65D 8562, F17C 1100
Patent
active
053465180
ABSTRACT:
During wafer fabrication, a transportable enclosure, such as a Standard Manufacturing InterFace (SMIF) pod encloses a nascent product, such as a semiconductor wafer, to protect the wafer against contamination during manufacture, storage or transportation. However chemical vapors emitted inside the pod can accumulate in the air and degrade wafers during subsequent fabrication. In order to absorb the vapors inside a closed pod, a vapor removal element typically including an activated carbon absorber, covered by a particulate-filtering vapor-permeable barrier, and covered by a guard plate with holes is disposed within the enclosure. A vapor removal element is disposed closely adjacent to each respective wafer. Alternatively, a single vapor removal element is located inside the enclosure. In certain instances, a fan or thermo-buoyant circulation causes any vapors located inside the enclosure to a vapor removal element for removal. Alternatively a porous vapor removal element may be disposed for removing vapors from air entering the enclosure. In another embodiment a vapor removal element is integrated with the back face of each wafer.
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Baseman Robert J.
Brown Charles A.
Eldridge Benjamin N.
Rothman Laura B.
Wendt Herman R.
Crawford L. M.
Feig Philip J.
International Business Machines - Corporation
Kaufman Stephen C.
Warden Robert J.
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