Method and apparatus for preventing cyclotron breakdown in parti

Details Method and apparatus for preventing cyclotron breakdown in parti Method and apparatus for preventing cyclotron breakdown in parti

1986-01-15

1987-08-18

Walsh, Donald P.

Induced nuclear reactions: processes, systems, and elements

Nuclear fusion

Magnetic confinement of plasma

376121, 376131, 376132, 376133, 219121P, B23K 900

Patent

active

046876162

ABSTRACT:
Cyclotron breakdown is prevented in a partially evacuated waveguide by providing a section of waveguide having an axial cut therein in order to apply a potential across the two halves of the waveguide. This section is positioned in the waveguide crossing the area of electron cyclotron resonance. The potential applied across the waveguide halves is used to deflect seed electrons into the wall of the waveguide in order to prevent ionization of gas molecules and creation of more electron ion pairs which would result in cyclotron breakdown. Support means is also disclosed for electrically isolating the waveguide halves and transition means is provided between the section of the waveguide with the axial cut and the solid waveguide at either end thereof.

REFERENCES:
patent: 3883761 (1975-05-01), Hendry
patent: 4263097 (1981-04-01), Ohkawa
patent: 4292124 (1981-09-01), Fisch
patent: 4354998 (1982-10-01), Ohkawa
patent: 4423001 (1983-12-01), Fisch
patent: 4425295 (1984-01-01), Fisch
patent: 4511782 (1985-04-01), Motley
Forrer, et al., "Duplexing & Switching w/Multipactor Discharge"; IRE vol. 50, pp. 442-450, Apr. 1962.

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