Coating solution for silica-based coating film and method for th

Details Coating solution for silica-based coating film and method for th Coating solution for silica-based coating film and method for th

1997-09-23

1998-08-18

Brunsman, David

Compositions: coating or plastic

Coating or plastic compositions

Silicon containing other than solely as silicon dioxide or...

C09D18306

Patent

active

057953783

ABSTRACT:
Proposed is a coating solution for the formation of a silica-based coating film on the surface of a substrate used in the manufacturing process of semiconductor devices as well as a method for the coating solution, which exhibits excellent storage stability without gelation and is capable of forming a silica-based coating film free from the troubles due to evolution of gases such as crack formation even when the coating film has a relatively large thickness. The coating solution is prepared by the hydrolysis reaction of a trialkoxy silane such as triethoxy silane dissolved in propyleneglycol dimethyl ether in a specified concentration with addition of a specified amount of water followed by removal of the alcohol formed by the hydrolysis reaction of the trialkoxy silane by distillation to such an extent that the content of the alcohol in the coating solution does not exceed 10% by weight or, preferably, 3% by weight.

REFERENCES:
patent: 5446088 (1995-08-01), Haluska
patent: 5496402 (1996-03-01), Sakamoto et al.

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