Electron beam exposure apparatus

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

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Details

250306, A61K 2702

Patent

active

041581407

ABSTRACT:
Disclosed is an electron beam exposure apparatus which comprises an electron gun to produce an electron beam, a mask plate with an aperture which passes the electron beam and forms a bundle of electron beam components with a sectional shape corresponding to the shape of the aperture, and an electron lens for converging the bundle of electron beam components and applying the bundle to a workpiece. The aperture includes a tapered plane across the thickness of the mask plate, the tapered plane facing the incidence side of the electron beam.

REFERENCES:
patent: 3707765 (1973-01-01), Coleman
patent: 4122335 (1978-10-01), Sullivan

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