Method for making lithographic printing plate using light wavele

Radiation imagery chemistry: process – composition – or product th – Transfer procedure between image and image layer – image... – Diffusion transfer process – element – or identified image...

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430230, 430246, 430251, 430944, G03C 554, G03F 706

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active

047849339

ABSTRACT:
Lithographic printing plates which have such a high sensitivity as permitting use of semiconductor laser beam of low output, a high resolving power and a high printing endurance and are free from occurrence of scumming are made by a method which comprises imagewise exposing a light sensitive material which comprises a support and at least a silver halide emulsion layer and a surface physical development nuclei layer provided on the support, said emulsion layer comprising silver halide grains which contain at least silver bromide and containing at least one sensitizing dye having a maximum spectral sensitivity in the region of longer than 700 .mu.m and then developing the exposed light sensitive material with a silver complex diffusion transfer developer containing at least a thiocyanate. Further improvement can be obtained by providing an antihalation means to keep the reflectance of a light of longer than 700 .mu.m at 13-40%.

REFERENCES:
patent: 3728114 (1973-04-01), Futaki et al.
patent: 4160670 (1979-07-01), Tsubai et al.
patent: 4297429 (1981-10-01), Kanada et al.
patent: 4501811 (1985-02-01), Saikawa et al.

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