Method of etching using a silver/silver oxide reference electrod

Details Method of etching using a silver/silver oxide reference electrod Method of etching using a silver/silver oxide reference electrod

1993-12-17

1995-01-31

Dang, Thi

Chemistry: electrical and wave energy

Processes and products

Electrostatic field or electrical discharge

2041291, 20412975, 156627, C23F 300

Patent

active

053856520

ABSTRACT:
Generally, the invention includes a method of wet electrochemical etching of a substrate with an anisotropic etchant using a silver/silver oxide (Ag/Ag.sub.2 O) reference electrode. The silver/silver oxide reference electrode can be used with electrochemical etch-stop techniques to fabricate a variety of semiconductor devices including microsensors and microactuator in a variety of anisotropic etchants. The silver/silver oxide reference electrode eliminates the need to use glass or plastic tubes.

REFERENCES:
patent: 5173149 (1992-12-01), Nojiri et al.
Newman, John S., Electrochemical Systems, Prentice-Hall, 1973, pp. 107-123.

Affiliated with

Also associated with

Rating

Method of etching using a silver/silver oxide reference electrod does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of etching using a silver/silver oxide reference electrod, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of etching using a silver/silver oxide reference electrod will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1100748