Digital electrochemical etching of compound semiconductors

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

2041293, 437234, C25F 312

Patent

active

053856511

ABSTRACT:
A method for the digital electrochemical etching of compound semiconductors in an electrochemical flow cell system in which alternating electrochemical potentials are applied between a reference electrode and the compound semiconductor sufficient to strip portions, preferably atomic layers, of the elements of compound semiconductors from the compound semiconductors.

REFERENCES:
patent: 4058430 (1977-11-01), Suntola et al.
patent: 4369099 (1983-01-01), Kohl et al.
patent: 4628591 (1986-12-01), Zorinsky et al.
Goodman et al., Atomic Layer Epitaxy, J. Appl. Phys. 60, R65 Aug. 1, 1986.
Kuech et al., Atomic Layer Growth and Processing, Mat. Res. Soc. Proc. 222 (1991).
Gregory et al., Electrochemical Atomic Layer Epitaxy, J. Electroanal. Chem. 300, 543 (1991).
Gregory et al., Conditions for the Deposition of CdTe, J. Electrochem. Soc., 138, 1279 May, 1991.
Suggs et al., Atomic Layer Growth and Processing, Mat. Res. Soc. Proc. 222, 283 (1991).
Kolb, Advances in Electrochemistry and Electrochemical Engineering, vol. 11, 125 (1978).
Juttner et al., Underpotential Metal Deposition on Single Crystal Surfaces, Z. Phys. Chem. N.R. 122, 163 May 24, 1980.
Meguro et al., Digital Etching of GaAs, Appl. Phys. Lett. 56, 1522 Apr. 16, 1990.
Horiike et al., Digital Chemical Vapor Deposition, J. Vac. Sci. Tech. A, 8, 1844 May/Jun. 1990.
Meguro et al., Atomic Layer Growth and Processing, Mat. Res. Soc. Proc. 222, 121 (1991).
Sakave et al., Digital Process for Advanced VLSI's, Mat. Res. Soc. Proc. 222, 195 (1991).
Maki et al., Laser Bilayer Etching of GaAs Surfaces, Appl. Phys. Lett. 55, 91 Jul. 10, 1989.
Pourbaix et al., Cadmium, Atlas of Electrochemical Equilibria in Aqueous Solutions (1966).
Villegas et al., Formation of Ordered, Nonreconstructed CdTe(III), J. Electrochem. Soc. 138, 1310 May, 1991.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Digital electrochemical etching of compound semiconductors does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Digital electrochemical etching of compound semiconductors, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Digital electrochemical etching of compound semiconductors will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1100744

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.