Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1993-05-05
1994-11-15
Neville, Thomas R.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 22, 430311, 430394, 430269, G03F 900
Patent
active
053647181
ABSTRACT:
A method is provided for exposing a semiconductor device pattern onto a semiconductor substrate by repeatedly exposing an adjoining arrangement of a plurality of unit patterns. The device pattern is first divided into a plurality of unit patterns. Then, a stencil mask is provided with transmitting openings having shapes conforming to the respective unit patterns. Pattern lines on the stencil mask of the unit patterns which are to be connected with each other have at least one connecting end provided with at least one protrusion having a width less than that of the corresponding pattern lines. The protrusion on the connecting end reduces errors such as interruptions or excessive broadening in an exposed pattern line due to misalignment. Also disclosed is a stencil mask for carrying out the present inventive method.
REFERENCES:
patent: 4181860 (1980-01-01), Sumi
patent: 4591540 (1986-05-01), Bohlen et al.
patent: 4895780 (1990-01-01), Nissan-Cohen et al.
Sze, S. M., VLSI Technology, Section 7.4.3 on pp. 284-286, Bell Laboratories, 1983.
Oae Yoshihisa
Sakamoto Kiichi
Fujitsu Limited
Neville Thomas R.
LandOfFree
Method of exposing patttern of semiconductor devices and stencil does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of exposing patttern of semiconductor devices and stencil, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of exposing patttern of semiconductor devices and stencil will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1096463