Method and apparatus for regeneration of a copper-containing etc

Chemistry: electrical and wave energy – Processes and products

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

204107, 204130, C25C 112

Patent

active

045085994

ABSTRACT:
A method and apparatus for the regeneration of a copper-containing etching solution which contains copper (II) chloride as well as alkali chloride as a sequestering agent, wherein the cathode is operated at a current density of 40-400 A/dm.sup.2 and the anode is operated at a current density of 1-100 A/dm.sup.2. Copper forms at the cathode as a powdered slurry while chlorine forms at the anode which oxidizes copper (I) chloride to copper (II) chloride. With this method one can process etching solutions which contain not only copper but also base metals including zinc from etching brass or tombac, and obtain a powdered mixture of copper and base metal. The apparatus features a rotating disk-shaped cathode from whose outer face the metal powder is stripped by a scraper.

REFERENCES:
patent: 1959376 (1934-05-01), Lucas
patent: 4269678 (1981-05-01), Faul et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method and apparatus for regeneration of a copper-containing etc does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for regeneration of a copper-containing etc, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for regeneration of a copper-containing etc will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1089885

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.