Polishing pad for a fine finish

Details Polishing pad for a fine finish Polishing pad for a fine finish

1985-01-18

1986-04-01

Lieberman, Paul

Abrasive tool making process, material, or composition

Miscellaneous

51308, 556425, B24D 1700

Patent

active

045795649

ABSTRACT:
A medium for polishing surfaces comprised of very fine silica particles bonded into a resinous foam. The medium is compounded by bubbling ammonia through a mix of polyol and ethyl silicate to generate bonded silica particles of very small size, then adding a di-isocyanate compound to develop the foam.

REFERENCES:
patent: 3992429 (1976-11-01), Knollmueller
patent: 4035411 (1977-07-01), Heckert et al.
patent: 4440745 (1984-04-01), Schmidt et al.
patent: 4503242 (1985-03-01), Plueddemann

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