Non-volatile semiconductor memory device and fabrication method

Static information storage and retrieval – Floating gate

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

365175, G11C 1300

Patent

active

061221929

ABSTRACT:
A non-volatile semiconductor memory device is provided with a circuit that protects a tunnel oxide film from the charging phenomenon. This circuit comprises a first junction diode including an N.sup.+ -type diffusion layer and a P-type well, and a second junction diode including a P-type well and an N-type well. When a voltage applied to the control gate is greater than all of a write voltage, a read voltage, and an erasure voltage that would be applied to the control gate, a current is guided through that circuit.

REFERENCES:
patent: 5978258 (1999-11-01), Manning
Nikkei Microdevices, Oct. 1988, pp. 102-111.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Non-volatile semiconductor memory device and fabrication method does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Non-volatile semiconductor memory device and fabrication method , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Non-volatile semiconductor memory device and fabrication method will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1079897

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.