Light-sensitive silver halide photographic material having high

Radiation imagery chemistry: process – composition – or product th – Luminescent imaging

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430502, 430509, 430966, G03C 517

Patent

active

054551390

ABSTRACT:
Disclosed is a light-sensitive silver halide photographic material comprising a support having a first face and a second face, a first photographic component layer being provided on the first face and a second photographic component layer being provided on the second face, each of the first and second component layer comprising a silver halide emulsion layer, wherein; when an exposure dose at a position on the first face is an exposure dose giving a density of a fog density +1.60 after exposing from the first face side and developing the material, a density at a position on the second face corresponding to the position on the first face is fog +0.20 or less, and an amount of a light which transmitted through the first component layer and the support and reaching an interface between the support and the second component layer is 12 to 75% of a light to which the first face side of the material is exposed.

REFERENCES:
patent: 4994355 (1991-02-01), Dickerson et al.
patent: 4997750 (1991-03-01), Dickerson et al.
patent: 5021327 (1991-06-01), Bunch et al.
Research Disclosure 308119, Dec. 1989.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Light-sensitive silver halide photographic material having high does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Light-sensitive silver halide photographic material having high , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Light-sensitive silver halide photographic material having high will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1076739

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.