Method and apparatus for identifying failure sites on IC chips

Semiconductor device manufacturing: process – With measuring or testing

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438 4, 438 16, 324750, 324753, H01L 2166

Patent

active

061210595

ABSTRACT:
The present invention provides a method for identifying failure sites on a defective IC chip by utilizing a glass substrate equipped with a heating device and then coating a liquid crystal material layer on top. The liquid crystal device can be positioned in contact, or immediately adjacent to a surface of an IC device to be detected. After the liquid crystal temperature is raised to just below its transition temperature, a voltage signal can be fed into the IC device to trigger an overheating at a short or leakage to raise the liquid crystal material immediately adjacent to the short or leakage to a temperature above its transition temperature. Hot spots are thus produced to appear as bright spots for easy identification under an optical microscope.

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patent: 5963040 (1999-10-01), Liu

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