Hydrazone compound and photosensitive material using said compou

Details Hydrazone compound and photosensitive material using said compou Hydrazone compound and photosensitive material using said compou

1992-03-12

1993-09-21

Raymond, Richard L.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

Radiation-sensitive composition or product

430 69, 430 73, 430 74, 549 59, 549 74, 549435, 549442, 564251, G03G 506, G03G 1504, G03G 1502, C07C25186

Patent

active

052468089

ABSTRACT:
The present invention provides a hydrazone compound of the following general formula (I). This compound presents a higher hole mobility as compared with a conventional electric charge transferring material such as a conventional hydrazone compound or the like. Accordingly, when a photosensitive layer contains, as the electric charge transferring material, the hydrazone compound of the present invention, there can be obtained an electrophotosensitive material which is excellent in sensitivity and charging ability and has high repeating characteristics. ##STR1## (wherein R.sup.1, R.sup.2, R.sup.3, R.sup.4, R.sup.5 and R.sup.6 may be same as or different from one another, and each is a hydrogen atom, an alkyl group, an alkoxy group, an aralkyl group or an aryl group, each of said alkyl, alkoxy, aralkyl and aryl groups may have a substituent group; A.sup.1, A.sup.2, A.sup.3, A.sup.4, A.sup.5 and A.sup.6 may be same as or different from one another, and each is a hydrogen atom, an alkyl group, an aralkyl group, an aryl group or a heterocyclic group, and each of said alkyl, aralkyl, aryl and heterocyclic groups may have a substituent group; l, m and n each is 0 or 1; Z is a group:N-N or a carbon atom; and provided that A.sup.1, A.sup.2, A.sup.3, A.sup.4, A.sup.5 and A.sup.6 should not be hydrogen atoms simultaneously.)

REFERENCES:
patent: 4465857 (1984-08-01), Neumann et al.
patent: 4606988 (1986-08-01), Sasaki
patent: 4666809 (1987-05-01), Matsumoto et al.
patent: 4988596 (1990-02-01), Ueda

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