Oxide superconductor thin film prepared by MBE

Superconductor technology: apparatus – material – process – High temperature devices – systems – apparatus – com- ponents,... – Superconductor next to layer containing nonsuperconducting...

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505190, 505191, 505701, 505702, 428930, 428702, 427 62, B32B 900

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active

055456111

ABSTRACT:
An oxide superconductor thin film is formed on a substrate by emitting molecular beams of constituent elements of the oxide superconductor to the substrate under high vacuum, wherein at first a molecular beam of one of the constituent elements of the oxide superconductor, of which an oxide thin film can be deposited so as to have a smooth surface, is emitted so as to form the oxide thin film of one or two unit cells. And then, all the molecular beams of constituent elements of the oxide superconductor are emitted to the oxide thin film so as to form the oxide superconductor thin film.

REFERENCES:
patent: 5116811 (1992-05-01), Abe et al.
patent: 5135906 (1992-08-01), Harada et al.
Wang et al., "High Tc Films by Molecular Beam Epitaxy", High Tc Superconductor Thin Films, edited by Correra (1992) pp. 549-554.
Schuhl et al., "Atomic Layer by Atomic Layer Growth of DyBaCuO Superconducting Thin Films by Molecular Beam Epitaxy", Appl. Phys. Lett. 57(8), Aug. 1990, pp. 819-821.
Watanabe et al., "Molecular Beam Epitaxy Study of B.sub.i2 S.sub.r2 C.sub.u O.sub.x Using NO.sub.2 as an Oxidizing Agent", Jpn. J. Appl. Phys., 29(7), Jul. 1990, pp. L1111-1113.

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