Patent
1990-02-22
1991-12-10
Hille, Rolf
357 34, 357 43, H01L 2710
Patent
active
050722859
ABSTRACT:
A Bi-CMOS gate array comprises basic cells combining CMOS transistors and bipolar transistors. The basic cell is formed of a region for forming p-MOS transistors, a region for forming n-MOS transistors and a region for forming bipolar transistors. The region for forming p-MOS transistors comprises gates aligned spaced apart from each other in a first direction and p-type source and drain regions formed spaced apart from each other in the first direction so as to be disposed at the opposite sides of each gate and having a predetermined width. The region for forming n-MOS transistors comprises gates formed spaced apart from each other in the first direction and n-type source and drain regions formed spaced apart from each other in the first direction so as to be disposed at the opposite sides of each gate and having a predetermined width. The region for forming bipolar transistors comprises p-type source or drain region of the region for forming p-MOS transistors as a base region, and an n-type emitter region formed in the base region and a region for taking out the potential of substrate of the p-MOS transistor as a collector region. An npn bipolar transistor formed in the region for forming p-MOS transistors can be electrically isolated from the other p-MOS transistor and used by holding gates disposed at the opposite sides of the base region at a power supply potential.
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"A Subnanosecond Low Power Advanced Bipolar-SMOS Gate Array", International Conference on Computer Design, 1984, pp. 428-433.
Hanibuchi Toshiaki
Ueda Kimio
Ueda Masahiro
Hille Rolf
Loke Steven
Mitsubishi Denki & Kabushiki Kaisha
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