Semiconductor integrated circuit having region for forming compl

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

357 34, 357 43, H01L 2710

Patent

active

050722859

ABSTRACT:
A Bi-CMOS gate array comprises basic cells combining CMOS transistors and bipolar transistors. The basic cell is formed of a region for forming p-MOS transistors, a region for forming n-MOS transistors and a region for forming bipolar transistors. The region for forming p-MOS transistors comprises gates aligned spaced apart from each other in a first direction and p-type source and drain regions formed spaced apart from each other in the first direction so as to be disposed at the opposite sides of each gate and having a predetermined width. The region for forming n-MOS transistors comprises gates formed spaced apart from each other in the first direction and n-type source and drain regions formed spaced apart from each other in the first direction so as to be disposed at the opposite sides of each gate and having a predetermined width. The region for forming bipolar transistors comprises p-type source or drain region of the region for forming p-MOS transistors as a base region, and an n-type emitter region formed in the base region and a region for taking out the potential of substrate of the p-MOS transistor as a collector region. An npn bipolar transistor formed in the region for forming p-MOS transistors can be electrically isolated from the other p-MOS transistor and used by holding gates disposed at the opposite sides of the base region at a power supply potential.

REFERENCES:
patent: 4682202 (1987-07-01), Tanizawa
patent: 4825274 (1989-04-01), Higuchi et al.
patent: 4829200 (1989-05-01), Downey
patent: 4868626 (1989-09-01), Nakazato et al.
patent: 4868628 (1989-09-01), Simmons
patent: 4907059 (1990-03-01), Kobayashi et al.
patent: 4954865 (1990-09-01), Rokos
"A Subnanosecond Low Power Advanced Bipolar-SMOS Gate Array", International Conference on Computer Design, 1984, pp. 428-433.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Semiconductor integrated circuit having region for forming compl does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Semiconductor integrated circuit having region for forming compl, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Semiconductor integrated circuit having region for forming compl will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1044515

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.