Pattern data handling system for an electron beam exposure syste

Details Pattern data handling system for an electron beam exposure syste Pattern data handling system for an electron beam exposure syste

1981-10-05

1984-02-21

Anderson, Bruce C.

Boots, shoes, and leggings

364490, 2504922, G02B 2700, H01J 3700

Patent

active

044333846

ABSTRACT:
A pattern data handling system for an electron beam exposure system wherein figure data conversion is performed simultaneously with irradiation of a workpiece, thereby providing high speed operation. Figure data, containing figure descriptions for a stripe area, is subdivided into blocks of segment figure data and is stored in a pattern data memory. Multiple pattern generators, each including a bit map memory, simultaneously convert blocks of segment figure data to bit maps and store the bit maps in their respective bit map memories. The bit maps are transferred out of the bit map memories and through a shift register one at a time to provide continuous beam blanking data. The system is particularly useful for electron beam exposure of reticles which are characterized by little or no repetition of features and by relatively large features.

REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 4151421 (1979-04-01), Sumi
patent: 4267456 (1981-05-01), Hidai et al.
patent: 4280186 (1981-07-01), Hidai et al.
Matsumoto et al., "Electron Beam Exposure System For LSI Mask and Reticle Fabrication," Toshiba Review, No. 119, Jan.-Feb. 1979.
Cannon et al., "Pattern Data Flow in the HP Electron Beam System," Hewlett-Packard Journal, May 1981.
Sumi et al., "Data Compaction Method For Raster-Scan Exposure System," J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, p. 1809.

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