Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge
Patent
1979-05-08
1981-08-11
Williams, Howard S.
Chemistry: electrical and wave energy
Processes and products
Electrostatic field or electrical discharge
2041296, 20412955, B23P 100, C25F 302
Patent
active
042832594
ABSTRACT:
A method for high resolution maskless chemical and electrochemical machining is described. Preferential etching results from exposing those regions where machining is sought to an energy beam. Such exposures can increase the ething rate in the case of electrochemical machining by a factor of 10.sup.3 to 10.sup.4. Such enhancement is sufficient to make masking unnecessary.
REFERENCES:
patent: 3013955 (1961-12-01), Roberts
patent: 3265599 (1966-08-01), Soonpaa
patent: 3345274 (1967-10-01), Schmidt
patent: 3345275 (1967-10-01), Schmidt et al.
patent: 3529961 (1970-09-01), Schaefer et al.
patent: 3706645 (1972-12-01), Lasser
patent: 3810829 (1974-05-01), Fletcher
patent: 3935117 (1976-01-01), Suzuki et al.
patent: 4063063 (1977-12-01), Funck et al.
patent: 4069121 (1978-01-01), Baud et al.
patent: 4161431 (1979-07-01), Gould
patent: 4161436 (1979-07-01), Gould
G. C. Oliver, "Plating Fine Lines With a Nozzle", Insulation/Circuits, pp. 23-24, (Jul. 1978).
M. O. Aboel Fotoh and R. J. von Gutfeld, "Effects of Pulsed Laser Radiation On Thin Aluminum Films", Journal of Applied Physics, vol. 43, No. 9, pp. 3789-3794 (Sep. 1972).
W. Konig and H. Degenhardt, "The Influence of Process Parameters and Tool-Electrode Geometry on the Development of the Overcut in Electrochemical Machining with High Current Densities", (Abstract) (1971), Fundamentals of Electrochemical Machining, Editor C. L. Faust, Electrochemical Society, Princeton, New Jersey.
Electrochemical Society, Abstract No. 286, vol. 77, p. 759, (1977).
W. Kern and J. M. Shaw, "Electrochemical Delineation of Tungsten Films For Microelectronic Devices", Journal of Electrochemical Society: Electrochemical Technology, vol. 118, No. 10, pp. 1699-1704, Oct. 1971.
J. F. Thorpe and R. D. Zerkle, "A Theoretical Analysis of the Equilibrium Sinking of Shallow, Axially Symmetric, Cavities by Electrochemical Machining", (Abstract) 1971, Fundamentals of Electrochemical Machining, Editor C. L. Faust, Electrochemical Society, Princeton, N.J.
Bestel et al., Abstract No. 286, "Fluid Flow Masking Selective Plating Technique", Electrochemical Society, (77) p. 759 (1977).
Melcher Robert L.
Romankiw Lubomyr T.
von Gutfeld Robert J.
International Business Machines - Corporation
Jones II Graham S.
Valentine D. R.
Weins Michael J.
Williams Howard S.
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