Photo-excited processing apparatus and method for manufacturing

Details Photo-excited processing apparatus and method for manufacturing Photo-excited processing apparatus and method for manufacturing

1993-08-24

1997-10-28

Niebling, John

Coating apparatus

Gas or vapor deposition

With treating means

118722, C23C 1600

Patent

active

056813945

ABSTRACT:
A photo-excited processing apparatus includes a reaction chamber to be filled with reaction gas, photo-excitation means for irradiating a light beam from light source means through a light transmissive window formed in the reaction chamber to excite the raw gas, and multi-holed transparent diffusion means arranged between the light transmissive window of the reaction chamber and a substrate to be mounted in the reaction chamber. The multi-holed transparent diffusion means has a diffusion plane on at least one surface thereof having a plurality of holes formed therein and being transparent to the light beam.

REFERENCES:
patent: 4534816 (1985-08-01), Chen et al.
patent: 4811684 (1989-03-01), Tashiro et al.
patent: 4994301 (1991-02-01), Kusumoto et al.
patent: 5215588 (1993-06-01), Rhieu
U.S. Ser. No. 07/901,161 Jun. 19, 1992 Suzuki.

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