Method for the precise determination of photoresist exposure tim

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364491, 364571, 356357, G01B 902

Patent

active

043085865

ABSTRACT:
A method for determining the precise exposure for a photoresist coating by measuring the coating thickness with a microspectrophotometer that provides data for plotting a nearly sinusoidal curve of percent reflectivity versus wavelength. The nominal exposure derived from the thickness measurement is then corrected to a precise value by extrapolation and normalization of the curve at the photosensitive wavelength of the photoresist.

REFERENCES:
patent: 3601492 (1971-08-01), Reichard
patent: 3824017 (1974-07-01), Galyon
patent: 3950170 (1976-04-01), Grosholz

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