Plasma CVD apparatus

Details Plasma CVD apparatus Plasma CVD apparatus

1985-07-23

1987-03-10

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118719, 118 501, C23C 1308

Patent

active

046483489

ABSTRACT:
There is disclosed a plasma CVD apparatus for depositing a film on a substrate by creating a discharge between the substrate and an electrode arranged to face the substrate, wherein the electrode is constructed by a plurality of hexagonal pillar electrodes arranged in a honeycomb structure.

REFERENCES:
patent: 4292153 (1981-09-01), Kudo et al.
patent: 4298443 (1981-11-01), Maydan
patent: 4466380 (1984-08-01), Jansen et al.

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