Purification process of novolar resins using acid treated chelat

Synthetic resins or natural rubbers -- part of the class 520 ser – Synthetic resins – Treating polymer containing material or treating a solid...

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568810, C08F 608

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active

056797664

ABSTRACT:
The invention is for a process of removal of dissolved cation contaminants from a resin solution. The process of the invention involves providing a chelating ion exchange resin modified by treatment with an acid and contact of said solution with said modified exchange resin for a time sufficient to remove ionic metal impurities. The invention is useful for removal of ionic contaminants from resin solutions used in the preparation of photoresists.

REFERENCES:
patent: 5288850 (1994-02-01), Matsumoto et al.
patent: 5300628 (1994-04-01), Honda
patent: 5446125 (1995-08-01), Honda et al.
patent: 5543263 (1996-08-01), Rahman et al.

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