Zero diffusion path gas dosimeter system and method

Details Zero diffusion path gas dosimeter system and method Zero diffusion path gas dosimeter system and method

1991-01-03

1992-05-05

Warden, Robert J.

Chemical apparatus and process disinfecting, deodorizing, preser

Analyzer, structured indicator, or manipulative laboratory...

Calorimeter

422 56, 422 57, 422 86, 422 87, 422 88, 435807, 436167, 436169, 436902, G01N 2100, G01N 3122

Patent

active

051105519

ABSTRACT:
A personal dosimeter for measuring the average concentration of undesirable contaminants gases such as nitrogen oxide includes a gas permeable web-like wafer formed of a material inert to polyamine. The wafer has a surface area having a numerical value at least one thousand times the value of the axial width of the wafer. The wafer is soaked in an absorptive medium not containing the ambient contaminant gas to be measured. The wafer, so soaked, is inserted within a gaseous impermeable housing from which the wafer may be selectively release and re-inserted. During an interval of release of the wafer, it is exposed for a predetermined interval of time to the ambient atmosphere. After re-insertion, the dosimeter is taken to an analysis site at which the wafer is removed and the molar concentration of products reaction with the atmospheric contaminant is measured.

REFERENCES:
patent: 4092120 (1978-05-01), Souvaniemi

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