Yttrium tantalate x-ray phosphors with reduced persistence

Details Yttrium tantalate x-ray phosphors with reduced persistence Yttrium tantalate x-ray phosphors with reduced persistence

1997-09-23

1999-05-04

Bonner, Melissa

Compositions

Inorganic luminescent compositions

Compositions containing halogen; e.g., halides and oxyhalides

C09K 1178

Patent

active

059001887

ABSTRACT:
A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a tungsten additive into the phosphor. The phosphor preferably contains at least about 4 ppm W. The method for incorporating the tungsten additive consists of adding a tungsten containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.

REFERENCES:
patent: 4225653 (1980-09-01), Brixner
patent: 4929385 (1990-05-01), Reddy
patent: 4938890 (1990-07-01), Reddy
patent: 4959174 (1990-09-01), Nakajima et al.
patent: 5009807 (1991-04-01), Reddy
patent: 5112524 (1992-05-01), Reddy et al.
patent: 5380463 (1995-01-01), Reddy et al.

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