Yttrium tantalate x-ray phosphors with reduced persistence

Details Yttrium tantalate x-ray phosphors with reduced persistence Yttrium tantalate x-ray phosphors with reduced persistence

1998-09-10

1999-08-17

Koslow, C. Melissa

Compositions

Inorganic luminescent compositions

Compositions containing halogen; e.g., halides and oxyhalides

C09K 1167, C09K 1168, C09K 1169, C09K 1182

Patent

active

059389745

ABSTRACT:
A composition and method are provided for reducing the persistence of yttrium tantalate x-ray phosphors having the monoclinic M' structure. Persistence is reduced by incorporating a molybdenum or vanadium additive into the phosphor. The method for incorporating the molybdenum or vanadium additive consists of adding a molybdenum or vanadium containing compound to the mixture of raw materials formulated to make the phosphor and firing the mixture at a temperature and for a time sufficient to form the phosphor.

REFERENCES:
patent: 4225653 (1980-09-01), Brixner
patent: 5009807 (1991-04-01), Reddy
patent: 5112524 (1992-05-01), Reddy et al.

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