XeCl Avalanche discharge laser employing Ar as a diluent

Details XeCl Avalanche discharge laser employing Ar as a diluent XeCl Avalanche discharge laser employing Ar as a diluent

1979-10-10

1981-11-17

Sikes, William L.

Oscillators

Molecular or particle resonant type

H01S 322

Patent

active

043014259

ABSTRACT:
A XeCl avalanche discharge exciplex laser which uses a gaseous lasing starting mixture of: (0.2%-0.4% chlorine donor/2.5%-10% Xe/97.3%-89.6% Ar). The chlorine donor normally comprises HCl but can also comprise CCl.sub.4 BCl.sub.3. Use of Ar as a diluent gas reduces operating pressures over other rare gas halide lasers to near atmospheric pressure, increases output lasing power of the XeCl avalanche discharge laser by 30% to exceed KrF avalanche discharge lasing outputs, and is less expensive to operate.

REFERENCES:
"Intense Lasing in Discharge Excited Noble-Gas Monochlorides" by Sze et al., Appl. Phys. Lett. 33 (5), Sep. 1, 1978, pp. 419-421.

Affiliated with

Also associated with

Rating

XeCl Avalanche discharge laser employing Ar as a diluent does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with XeCl Avalanche discharge laser employing Ar as a diluent, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and XeCl Avalanche discharge laser employing Ar as a diluent will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1294661